photoelectron spectra

基本解释

A new type technique of semiconductor cleaning is studied via infrared absorption spectra, X ray photoelectron spectra and surface tension detector.
报道了利用红外吸收谱、X射线光电子谱和表面张力测试仪对新型半导体清洗工艺进行研究的结果。
The results of cleaning using the new type of cleaning technique and RCA standard cleaning technique are compared. The results are obtained by X ray photoelectron spectra?
利用红外吸收谱、X射线光电子谱和原子力显微镜等，把它和标准RCA清洗工艺的清洗效果做了比较。
Then, X-ray photoelectron spectra (XPS) and H2-temperature programmed reduction (H2-TPR) were conducted to evaluate the variation of redox properties during the substitution process.
然后，X射线光电子能谱（XPS）和H2 -程序还原（H2 - TPR）等温度进行了评估，在替代过程中的氧化还原性的变化。